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Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers

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Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers

Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers
Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers

Large Image :  Optical Grade LiNbO3 Crystal For Pockels Cell Q Switching Of Lasers

Product Details:
Place of Origin: China
Brand Name: Crystro
Certification: SGS
Model Number: 1LiNbO15*4*1.2-C
Payment & Shipping Terms:
Minimum Order Quantity: 1 Piece
Price: Negotiable
Packaging Details: Transparent clean box
Delivery Time: 3-4 weeks
Payment Terms: T/T, Western Union, MoneyGram
Supply Ability: 1000 pcs per month
Detailed Product Description
Chemical Formula: LiNbO3 Growth Method: Czochralski
Crystal Structure: Trigonal System Dimensions: 15*4*1.2mm
Melting Point: 1250℃ Density: 4.64 G/cm3
Mohs Hardness: 5 Refractive Index: No=2.286 Ne=2.203 (632.8nm)
Lattice Constant: A=b=5.148Å , C=13.863 Å
High Light:

Optical Lithium Niobate Crystal

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Optical Grade LiNbO3 Crystal

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High Extinction Ratio LiNbO3 Crystal


Optical Grade LiNbO3 LN Crystal For Pockels Cell Q-Switching Of Lasers

 LiNbO3 LN Crystal For Pockels Cell Q-switching Of Lasers

Introduction:

Lithium niobate crystal has a long history and the most complete physical effects. It is used to prepare acoustic filters, resonators, delay lines, electro-optic modulators, electro-optic Q-switches, phase modulators, and other devices. It is widely used in electronic technology, optical communication technology, laser technology, and other fields have been widely used, and has shown important application prospects in the recent rapid development of fifth-generation wireless communication technology, micro-nano photonics, integrated photonics, and quantum optics.

 

Advantages:

  • Low Wavefront Distortion
  • High Extinction Ratio
  • Low Transmission Loss
  • High Damage Threshold

High Damage Threshold Threshold

 

Specifications:

 

Growth method Czochralski
Crystal structure Trigonal system
Transparency Range 420-5200nm
Lattice constant a=b=5.148Å c=13.863 Å
Melting point 1250℃
Curie temperature 1142 ℃
Density 4.64 g/cm3
Hardness 5 Mohs
Refractive index No=2.286 ne=2.203 (632.8nm)

 

 

LiNbO3 Q-switch Specifications:

Size available upon request
Tolerance of Size Z-axis: ± 0.2mm
X-axis and Y-axis: ± 0.1mm
Chamfer less than 0.5 mm at
Accuracy of Orientation Z-axis: < ±5′, X-axis and Y-axis: < ±10′
Parallelism <20′′
Finish 10/5 scratch/dig
Flatness λ/8 at 633nm
AR-Coating R<0.2% @1064nm
Electrodes Gold/Chrome plated on X-faces
Wavefront Distortion <λ/4 @633nm
Extinction Ratio >400:1 @633nm, φ 6mm beam

 

Contact Details
ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd.

Contact Person: Chen Dongdong

Tel: +86 18326013523

Fax: 86-551-63840588

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