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Magneto Optical Thin Film Use GGG Crystal

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China ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd. certification
China ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd. certification
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Magneto Optical Thin Film Use GGG Crystal

Magneto Optical Thin Film Use GGG Crystal
Magneto Optical Thin Film Use GGG Crystal Magneto Optical Thin Film Use GGG Crystal Magneto Optical Thin Film Use GGG Crystal

Large Image :  Magneto Optical Thin Film Use GGG Crystal

Product Details:
Place of Origin: China
Brand Name: Crystro
Certification: ISO9001
Model Number: CRGGG-1
Payment & Shipping Terms:
Minimum Order Quantity: 1 Piece
Price: Negotiable
Packaging Details: Carton Box
Delivery Time: 3-4 weeks
Payment Terms: T/T, Western Union, MoneyGram,Paypal
Supply Ability: 100 pcs per week
Detailed Product Description
Production Name: Gallium Gadolinium Garnet (GGG) Chemical Formula: Gd3Ga5O12
Lattic Parameter: A=12.376Å Growth Method: Czochralski
Density: 7.13g/cm3 Mohs Hardness: 8.0
Melting Point: 1725℃ Refractive Index: 1.954 At 1064nm
High Light:

Gd3Ga5O12 Magneto Optical GGG Substrates

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Gd3Ga5O12 GGG Optical Substrates

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Magneto Optical GGG Crystal

 

GGG Substrate, Gadolinium Gallium Garnet Substrates for Magneto-optical Film

 

GGG substrate, Gadolinium gallium garnet (GGG) is dedicated substrates for magneto-optical film. In the optical communication devices, require a lot of using 1.3μ and 1.5μ optical isolator, Its core component is the YIG or BIG film been placed in a magnetic field. GGG single crystal substrates of different tangential, which can achieve the best lattice match with these magneto-optical material, Thus ensuring the YIG, BIG film epitaxial growth be successful.
GGG have good physical and mechanical properties and chemical stability. GGG is the best substrate material for made the microwave isolators .

 

Main Advantages:

 

Large dimensions,from 2.8 to 76mm.

Low optical losses (<0.1%/cm)

High thermal conductivity (7.4W m-1K-1).

High laser damage threshold (>1GW/cm2)

 

 

Main Properties:

 

Chemical Formula Gd3Ga5O12
Lattic Parameter a=12.376Å
Growth Method Czochralski
Density 7.13g/cm3
Mohs Hardness 8.0
Melting Point 1725℃
Refractive Index 1.954 at 1064nm

 

 

 

 

 

 

 

 

 

CRYSTRO can offer:

 

Orientation [111] within ±15 arc min
Wave Front Distortion <1/4 wave@632
Diameter Tolerance ±0.05mm
Length Tolerance ±0.2mm
Chamfer 0.10mm@45º
Flatness <1/10 wave at 633nm
Parallelism < 30 arc Seconds
Perpendicularity < 15 arc min
Surface Quality 10/5 Scratch/Dig
Clear Apereture >90%
Large Dimensions of Crystals 2.8-76 mm in diameter
 

 

 

Magneto Optical Thin Film Use GGG Crystal 0

Contact Details
ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd.

Contact Person: Zheng

Tel: +86 18255496761

Fax: 86-551-63840588

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